sputtering Targets
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Contact UsTitanium Targets for Semiconductor Devices
We produce sputtering targets for thin film devices, helping to increase functionality in a wide range of electronic parts.
By making the metal structure fine and uniform, we have achieved low particle size from the initial stage of use to the end of life.
Features
- Achieves low particle size by fine and uniform metal structure and surface treatment
Impurity content(Unit: ppm)
| Grade | Fe | Ni | Cr | Na | K | O |
|---|---|---|---|---|---|---|
| 5N UP | <9 | <5 | <5 | <0.03 | <0.05 | <200 |
| 4N5 UP | <20 | <20 | <20 | <0.1 | <0.1 | <200 |
| 4N UP | <50 | <20 | <10 | <0.1 | <0.1 | <650 |
| 3N5 UP | <200 | <20 | <10 | <0.1 | <0.1 | <1000 |
Examples of uses
- Semiconductor devices
