sputtering Targets

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Titanium Targets for Semiconductor Devices

We produce sputtering targets for thin film devices, helping to increase functionality in a wide range of electronic parts.
By making the metal structure fine and uniform, we have achieved low particle size from the initial stage of use to the end of life.

Titanium Targets for Semiconductor Devices

Features

  • Achieves low particle size by fine and uniform metal structure and surface treatment

Impurity content(Unit: ppm)

Impurity content : Titanium Targets for Semiconductor Devices
Grade Fe Ni Cr Na K O
5N UP <9 <5 <5 <0.03 <0.05 <200
4N5 UP <20 <20 <20 <0.1 <0.1 <200
4N UP <50 <20 <10 <0.1 <0.1 <650
3N5 UP <200 <20 <10 <0.1 <0.1 <1000

Examples of uses

  • Semiconductor devices

If you have any inquiries, please contact us.

Open 9:00am-5:00pm (business days)

Contact Us
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